Low-temperature type N2 direct plasma
It is possible to process substrates that are sensitive to heat.
The AVP series uses N2 and air to create atmospheric pressure plasma. Since the plasma is directly irradiated onto the substrate, it provides strong modification power. Additionally, due to the minimal thermal impact, it is also possible to process substrates that are sensitive to heat. There are both bar-type and spot-type options available, allowing for nozzle designs tailored to the shape of the customer's substrate (with some restrictions).
- Company：Ito Corporation
- Price：Other
